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Wafer-Level Dispensing System

Wafer-Level Dispensing SystemSS101

The SS101 is a kind of high-stability and high-precision dispensing system with automatic wafer loading & unloading function which is developed based on Underfill process requirements of RDL First FoWLP, and is mainly used for advanced processes such as CoWoS and FoPoP. (The SS101 consists of one PC101EFEM handling system and two GS600SW wafer-level dispensing machines).
Integrating automatic wafer loading & unloading and wafer-level dispensing functions, the system can realize such functions as automatic wafer handling, alignment, preheating, operation heating, dispensing, and heat dissipation. It is compatible with international semiconductor communication protocols, is equipped with an AMHS automatic loading & unloading robot interface to match the information management requirements and unmanned management trends.
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Features and Advantages Features and Advantages

Supporting 8/12-inch wafer dispensing.

In the whole process of wafer turnover and operation, the temperature is finely controlled and automatically corrected to meet the Underfill process requirements while ensuring the safety of products.

The whole-process video monitoring facilitates product turnover, operation process observation, and problem tracing and analysis.

Dustproof class 100 (Class 100 workshop; Class 10 locally), meeting the environmental requirements of wafer-level packaging.

ESD protection meeting international IEC and ANSI standards.

System Composition System Composition

  • ❶ Loadport&Foup
  • ❷ Aligner
  • ❸ Code scanning station
  • ❹ Preheating station
  • ❺ Heat dissipation station
  • ❻ GS600SWA dispensing machine operation station
  • ❼ GS600SWB dispensing machine operation station
  • ❽ Robot handling module
ss101goucheng

作业流程 作业流程

  • PC101

    Foup
    loading
  • PC101

    Transport wafer to
    aligner by robot
  • PC101

    Wafer alignment+code
    scanning
  • PC101

    Transport wafer to
    preheating station by Robot
  • GS600SW

    CUF
    operation
  • GS600SW

    Lowering of ejector pin to adsorb wafer by disc
  • GS600SW

    Secondary preheating of wafer
  • PC101

    Transport wafer to GS600SW dispensing machine by Robot
  • PC101

    Primary preheating of wafer
  • GS600SW

    Wafer temperature holding and lifting of ejector pin for primary heat dissipation
  • GS600SW

    Transport wafer to heat dissipation station by Robot
  • GS600SW

    Secondary heat
    dissipation of wafer
  • PC101

    Transport wafer back to Foup original position by Robot